Nano-Imprint-Molding Resists for Lithography
نویسندگان
چکیده
منابع مشابه
9. Nanoimprint Lithography – Patterning of Resists Using Molding
Nanoimprint lithography (NIL) is an emerging high-resolution parallel patterning method, mainly aimed towards fields in which electronbeam and high-end photolithography are costly and do not provide sufficient resolution at reasonable throughput. In a top-down approach, a surface pattern of a stamp is replicated into a material by mechanical contact and threedimensional material displacement. T...
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ژورنال
عنوان ژورنال: Journal of Photopolymer Science and Technology
سال: 2003
ISSN: 0914-9244,1349-6336
DOI: 10.2494/photopolymer.16.435